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Vol.57, No.2, 91 ~ 97, 2019
Title
Optimization of ZnO/Ag/ZnO Transparent Conductive Electrodes Fabricated by Magnetron Sputtering
조우현 Woo Hyeon Jo , 최두호 Dooho Choi
Abstract
The critical role of the thicknesses of the top and bottom oxide layers, as well as Ag layer, in ZnO/ Ag/ZnO transparent conductive electrodes were investigated. The Ag forms a nearly continuous layer at the thickness of 8 nm, at which the Ag sheet resistance of 8.0 Ω/Sq. is lower than the typical criteria of 10 Ω/ Sq. By making independent changes in the thickness of the top and bottom ZnO layers, which serve as antireflection layers, it was found that the top ZnO layer thickness has a dominant impact, with the bottom ZnO layer thickness contributing a less but still significant amount. The optimized thicknesses for the top and bottom ZnO layers were found to be 40 and 20-30 nm, respectively, resulting in a peak transmittance of 97.1% and average visible light transmittance of 90.8%. According to the Haccke figure of merit (ФH=T10ave/RS), the value for the optimized ZnO/Ag/ZnO electrode was 0.048, which is highly competitive for transparent conductive electrodes for future optoelectronic devices. (Received December 19, 2018; Accepted January 8, 2019)
Key Words
transparent conductive electrodes, thin films, transmittance, sheet resistance
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