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Vol.53, No.8, 549 ~ 555, 2015
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| Title |
| Effect of the substrate bias voltage on the mechanical properties of nanocomposite CrZrSiN thin films |
| 김규성 Kyu Sung Kim , 김회근 Hoe Kun Kim , 라정현 Joung Hyun La , 김광배 Kwang Bae Kim , 이상율 Sang Yul Lee |
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| Abstract |
| Nanocomposite CrZrSiN thin films were deposited with various substrate bias voltages from 0 to -200 V using unbalanced magnetron sputtering. The crystalline structure, microhardness, microstructure, and adhesion properties of the CrZrSiN thin films were evaluated by X-ray diffraction, Fischer scope, field-emission scanning electron microscopy, and a scratch tester. The surface roughness and deposition rate decreased with an increase in the substrate bias voltage. The substrate bias voltage increased and the hardness increased to 36 GPa at -100 V, then decreased to 32 GPa as the substrate bias voltage further increased to -200V. The CrZrSiN thin films maintained their hardness up to 800℃ while the hardness of CrZrN film decreased rapidly over 500℃. The critical load (Lc3) increased from 8 N to 35 N up to a substrate bias voltage of -100 V, while the critical load decreased to 8 N with further increase of the substrate bias voltage. (Received February 07, 2015) |
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| Key Words |
| thin films, plasma deposition, mechanical properties, transmission electron microscopy, TEM |
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