발간논문

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Vol.51, No.4, 259 ~ 265, 2013
Title
Optimal Pressure and Temperature Conditions for Deposition of FOTS Thin Films Suitable for Anti-Stiction Layers
Dong Chan Kim , Tae Young Kwon , Hyuk Min Kim , Hyun Woo Lim , Ji Young Roh , Caroline Sunyong Lee , Jin Goo Park
Abstract
The optimum conditions for FOTS films deposited as vapor self-assembled monolayers for producing a hydrophobic film with low roughness was determined to be 10 Torr and 50℃. The root mean square (RMS) of film roughness was 0.72 nm and its contact angle 108.14°. These conditions are much simpler than the conventional process in which high temperature is known to result in high contact angles and reduced agglomeration of precursor molecules and roughness. However, we found that optimized hydrophobic FOTS film that provides an anti-stiction layer in micro-electro-mechanical systems can be obtained at low temperature and high pressure with a comparable contact angle to and lower roughness than the film obtained using the conventional process.
Key Words
thin films, vapor deposition, surface, atomic force microscopy, self assembled monolayer
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