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Vol.50, No.9, 653 ~ 658, 2012
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| Title |
| Formation of MoSi2 Layer by Hydrogen Reduction and Si-pack Cementation |
| 전인목 In Mok Jeon , 변종민 Jong Min Byun , 김세훈 Se Hoon Kim , 김진우 Jin Woo Kim , 김영도 Young Do Kim |
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| Abstract |
| In this study, a molybdenum disilicide (MoSi2) coating process was investigated by hydrogen reduction and Si-pack cementation. At first, the metallic Mo coating was carried out by hydrogen reduction of MoO3 powder at 750℃ for various holding times (1, 2, 3 h) in hydrogen atmosphere. A 4.3 ㎛thick metallic molybdenum thin film was formed at 3 h. MoSi2 was obtained by Si-pack cementation on molybdenum thin film through hydrogen reduction processing. It was carried out using Si : Al2O3 : NH4Cl = 5 : 92 : 3 (wt%) packs at 900℃ for various holding times (30, 60, 90 min) in Ar atmosphere. When the holding time was 90 min, a MoSi2 layer was coated successfully and a 15.4 ㎛thickness was observed. |
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| Key Words |
| thin films, coating, diffusion, scanning electron microscopy, SEM, hydrogen reduction |
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