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Vol.48, No.4, 347 ~ 353, 2010
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| Title |
| A Reduction Process of Palladium Oxide Thin Films and Hydrogen Gas Sensing Properties of Reduced Palladium Thin Films |
| 이영택 Young Tack Lee , 김연주 Yeon Ju Kim , 이준민 Jun Min Lee , 조진현 Jin Hyoun Joe , 이우영 Woo Young Lee |
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| Abstract |
| This study reports a novel method off abricating highly sensitive hydrogen gas sensors based on PdQ thin films. The PdQ thin films with a thickness of 40 nm were deposited on Si substrates under Ar and Q2 ambient conditions using a reactive dc magnetron sputtering system. Considerable changes in the resistance of the palladium oxide thin films were observed when they were initially exposed to hydrogen gas, as a result of the reduction process. The sensitivity of the PdQ thin films was found to be as high as 90%. After the thin films were exposed to hydrogen gas, the nano-sized cracks were discovered to have formed on the surface of the PdQ thin films. These types of nano-cracks that formed onthe deoxidized PdQ thin films are known toplay a key role incausing a four-fold reduction of the response time of the absorption process. The results of this study demonstrate that deoxidized PdQ thin films can be applied for use in the creation of high-sensitivity hydrogen sensors. (Received November 16, 2009) |
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| Key Words |
| Hydrogen absorbing materials, sputtring, hydrogen, scanning electron microscopy, SEM, microstructure |
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