발간논문

Home > KJMM 논문 > 발간논문

Vol.47, No.6, 378 ~ 383, 2009
Title
Fabrication of Fe3O4 Thin Film using Reactive DC Magnetron Sputtering
정민경 Min Kyung Jung , 박성민 Sung Min Park , 박대원 Dae Won Park , 이성래 Seong Rae Lee
Abstract
We investigated the effects of deposition conditions on the fabrication of Fe3O4 thin films using a reactive DC magnetron sputtering at room temperature. The structural, electrical, and magnetic properties of Fe oxide films dependence on the film thickness, oxygen flow rate, and the substrate crystallinity were also studied. We have successfully fabricated Fe3O4 film with thickness of about 10 nm under optimal reactive sputtering conditions. The saturation magnetization, resistivity, and Verwey transition of the Fe3O4 film were 298 emu/cc, 4.0×10(-2) Ωcm, and 125 K, respectively. (Received February 3, 2009)
Key Words
Fe3O4 film, half metallic reactive sputtering
| PDF
대한금속∙재료학회 │ (06633) 서울시 서초구 서초대로 56길 38 대한금속∙재료학회 회관 (서초1동 1666-12번지)
Tel : 070-4266-1646 │ FAX : 02-557-1080 │ E-mail : metal@kim.or.kr
Copyright ⓒ 2013 사단법인 대한금속∙재료학회 All rights reserved.