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Vol.46, No.6, 370 ~ 377, 2008
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| Title |
| Effects of Current Density and Phosphoric Acid Concentration on Anodic Oxide Film of Titanium |
| 김계성 Kye Sung Kim , 정원섭 Won Sub Chung , 신헌철 Heon Cheol Shin , 최영선 Young Son Choe , 조영래 Young Rae Cho |
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| Abstract |
| The formation of anodic oxide film of titanium (Ti) was studied at a variety of electrolyte concentrations and current density to clarify their effects on morphology, microstructure and composition of Ti oxide layer. For the analysis of the Ti oxide films, a scanning electron microscopy (SEM), X-ray diffractometer (XRD), and X-ray photoelectron spectroscopy (XPS) were used. The results showed that the concentration of phosphoric acid played a crucial role in the crystalline structure of the Ti oxide layer while the current density gave a critical effect on the thickness and diameter of its pore. In particular, the crystalline anatase phase with a thickness larger than 2 ?m, which is quite desirable for a dental implant application, could be readily prepared at the phosphoric acid concentration of 0.5 M and current density higher than 2.0 A/dm2. |
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| Key Words |
| Ti oxide Layer, anodizing, current density, electrolyte, microstructure |
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