| Abstract |
| ITO thin films were deposited on corning 1737 glass using a D.C. magnetron sputtering. The morphology, the crystallinity and the electrical properties of ITO thin films were investigated by XRD, FESEM and 4 point probe system. The morphology of ITO particles changed from round island to polygonal shape as the O2 flow rate increased. In the first stage of the growth of ITO thin films, amorphous phase occurred. As O2 flow rate increased, ITO thin film grew to the crystalline with preferred orientation of (400) and (440). The sheet resistance of ITO thin films decreased to 9Ω/_ when the substrate temperature was 350℃. In this study, preferred orientation of (400) and coarse island particle of ITO thin films were critical factor. |
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| Key Words |
| ITO, Microstructure, Thin film, Sheet resistance, Preferred orientation |
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