발간논문

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Vol.40, No.12, 1236 ~ 1243, 2002
Title
Micromechanical Analysis of the Effect of Residual Stress on the Nanoindentation Curve
이윤희 Yun Hee Lee , 권동일 Dong Il Kwon
Abstract
A new model is presented for measuring equi-biaxial stress on thin-film using nanoindentation. The model was focused on the analysis of a depth-shift in the nanoindentation curve by stress effect. A load-controlled relaxation of the shifted indentation depth was chosen to avoid the variation of the contact area occurred in a depth-controlled relaxation. Nanoindentation experiments on (100) W single crystal at artificial equi-biaxial stress states verified that the proposed load-controlled relaxation model is capable of analyzing the residual stress within the standard deviation of ±35.9 MPa.
Key Words
Residual stress, Nanoindentation, Load-controlled relaxation, Tungsten single crystal
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