Surface Treatment : Adhesion and Tribological Properties of MoS₂ Coatings Deposited by D. C Magnetron Sputtering
안영환Young Hwan Ahn,김선규Sun Kyu Kim
Abstract
In this study, deposition of MoS_2 thin films by D.C. magnetron sputtering was studied with regard to the micro-structural change of MoS_2 film and mechanical properties. The deposition parameters such as the working pressure, deposition time, bias voltage, etching time were varied to determine how these parameters affected the film morphology and mechanical properties of deposited films. The microstructure of the MoS_2 films is nanostructure and very strongly influenced by the sputtering process conditions. The grain size increased with the increase in the working pressure and decreased with the increase in the bias voltage.