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Vol.39, No.9, 1020 ~ 1027, 2001

Title

Research Papers / Surface Treatment : Electrochemical behavior of STS316L Film Prepared by Unbalanced Magnetron Sputtering

유지홍Ji Hong Yoo,권오현O Hyun Kwon,안승호Seung Ho Ahn,정윤모Yoon Mo Chang,남경훈Kyung hun Nam,김정구Jung Gu Kim,한전건Jeon Geon Han

Abstract

Coatings were deposited at 200℃ on S45C carbon steel using unbalanced magnetron sputtering (UBMS) of an fcc STS 316L (UNS S31603) target of 9㎝ in diameter. The total deposition pressure in the active Ar gas is 8×10^(-3)Torr. Coatings were deposited at various target power densities and bias voltages. Chemical compositions of metallic elements in coatings were measured by energy dispersive X-rays spectroscopy (EDS). X-Ray diffraction (XRD) measurements were performed to evaluate the crystal structure of the stainless steel films. Corrosion properties of the coated specimens were examined using electrochemical polarization measurements. The porosity rate was obtained from a comparison of the dc polarization resistance of the uncoated and coated substrate. The residual stress of the film was calculated from the curvature measured by stylus method. EDS results indicated that chemical compositions of coatings were similar to those of the target material that was a commercial grade STS 316L. XRD results showed that an austenitic phase could be achieved by using above 25W/㎠ power density in UBMS system. Potentiodynamic polarization curves indicated that the values of the corrosion potential of coatings are approximately at the potential of between those of bulk STS 316L and S45C. The increase of a power density caused the high residual tensile stress of coating, while, the increase of a bias voltage led to a substantial decrease in porosity. Finally, an optimized deposition condition for corrosion protection was found for 25W/㎠ , -200V coating.

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