Stress Measurements in the Layers of Thin Film Gas Sensors
추성호Sung Ho Choo,김영만Young Man Kim
Abstract
The mechanical properties of thin film materials are known to be different from those of bulk materials, it is generally overlooked in practice. The difference in mechanical properties can be misleading in the estimation of residual stress states in micro-gas sensor with multi-layer structure during manufacturing and in service. In this study the residual stress of each film layer in micro-gas sensor was measured according to the five difference sets of film stacking structure used for the sensor. The Pt thin film layer was found to have the highest tensile residual stress, which may affect the reliability of micro-gas sensor. For the Pt layer the changes in residual stress were measured as a function of processing variables during thermal cycling. In addition the effect of heat treatment on the microstructure was investigated during processing of the sensor. The residual stresses in the Pt layers caused by microstructural changes were also investigated.