| (TiAl)N films deposited by cathodic arc process employing two separate targets of Al and Ti have lots of macro-particles on the surface. The macro-particles were found out to be generated mainly from Al cathode of low melting temperature. In the previous study, TiN films deposited with external magnetic field showed remarkable reduction of surface droplet. For the (TiAl)N coatings, however, the efficiency of Al droplet removal was not so much as TiN films. A new coating concept combining magnetron sputtering and arc evaporation for improved coating properties was made in this study. (TiAl)N and Al-gradient (TiAl)N coatings were deposited by arc-magnetron hybrid process and content of Al in the films was changed by power density of Al magnetron sputtering source. This hybrid process allowed compositionally gradient (TiAl)N coatings to be deposited with low macro-particles and excellent adhesion. It is noted that Al-gradient (TiAl)N coating showed micro hardness of 3,000 ㎏/㎟ and good adhesion of HF2 grade. The present study introduces the hybrid process parameters involved. The formation behavior of (TiAl)N and Al-gradient (TiAl)N coatings were investigated by SEM, EDX AES and XRD. |
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