발간논문

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Vol.35, No.4, 501 ~ 509, 1997
Title
The Effects of Sputtering Conditions in Pre Sputtering on the Formation Behavior of Nitride Layer in the lon Nitriding of STS304 Stainles Steel
윤재홍 , 손명숙 , 이건환 Jae Hong Yoon , Myung Sook Son , Gun Hwan Lee
Abstract
Stainless steels in general has passive film having strong corrosion resistance on surface. Therefore it must be mesessarily removed by etching in mixing solution of sulfuric and chloric acid before nitriding treatment. But in the ion nitriding, nitride layer was easily formed because passive film was removed without difficult by sputtering effect. The removal extent of these passive films was greatly effected by gas mixing ratios and pressure and holding times of presputtering factors in presputtering stage. Thus we have examined the effect of the pre sputtering factors in contrast to ion nitriding behviour of next stage. As a results of experiment it has been known that presputtering pressure and holding time was not nearly effective on the formation behavior of nitride layer. But when Ar/H₂ gas mixing ratios was ½(vol%) was the most effective of the all presputtering conditions. It was resulted from the combination of mechanical reaction by argon bombardment and chemical reaction by reduction of hydregen on the passive film. For the ion nitriding of the STS304 having artificial oxide layers which was grown more thick than natural passive film, first of all, the oxide layer must be removed to the appropriate thickness which could easily diffuse nitrogen into matrix by bombardment of Argon ion.
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