발간논문

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Vol.34, No.5, 622 ~ 629, 1996
Title
Research Paper - Electrometallurgy - : TiS2 Film Fabrication for Li Solid Batteries
이도형Do Hyung Lee, 이홍로Hong Ro Lee
Abstract
Fabrications of TiS₂ cathode films for Li solid batteries were executed with LPCVD method using TiCl₄ and H₂S as source gases to improve TiS₂ films having (110) crystallographic orientation in which the c-axises were parallel to the substrate plane. A (110) preferentially oriented TiS₂ thin films were obtained at 600℃ and total gas flow rate of about 400sccm. Improvement of surface roughness was obtained at the condition of 550℃ and 20mole ratio of H₂S/TiCl₄. Surface roughness, namely H_(max) of TiS₂ film obtained at 550℃ and of 20 mole ratio condition was about 0.67 ㎛. Micro hardness value was closely related to the surface morphology of TiS₂ film owing to surfacial crystallographic weaving. During discharging process from OCV to 1V at a 50 μA/㎠ current density with a battery system composed of TiS₂ cathode layer and LiClO₄-PC-DME electrolyte, the magnitude of discharge capacity was obtained about 100μAh/㎠
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