발간논문

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Vol.34, No.2, 192 ~ 198, 1996
Title
Research Paper - Mechanical Behavior - : Microstructure and Wear Resistance of ( TiAl ) N Film Synthesized by Cathodic Arc Plasma Deposition
윤주선Joo S . Yoon, 김형준Hyung J . Kim, 한전건Jeon G . Han, 송건Keon Song
Abstract
(TiAl)N films were deposited on high speed steel(SKH9) by Cathodic Arc Plasma Deposition employing two separate targets of Al and Ti, and the formation behaviors of the films were investigated by AES, EDX, XRD and SEM. The composition of (TiAl)N film was varied with control of current ratios of Al and Ti targets. As the Al target current increased, the atomic ratio of Al in the film increased and the hardness of (TiAl)N film was obtained to be 2200∼2700 ㎏/㎟ depending on the stoichiometry of Al and Ti in the film. The deposition of (TiAl)N film significantly enhanced the wear resistance of substrate during ball-on-disc type wear test at elevated temperatures up to 600℃. The (TiAl)N film with high density and good adhesion caused a significant reduction of friction coefficient and weight loss of substrate between Al₂O₃ ball and (TiAl)N film sliding system and the most effective improvement of wear resistance was obtained by (TiAl)N film with Al/Ti atomic ratio of 1.10.
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