A Study on the Friction Characteristics of RF Sputtered MoS2 / PTFE Films
이양기Sang Gi Lee, 이경준Kyung Joon Lee, 김영환Young Hwan Kim
Abstract
The RF sputtered MoS₂/PTFE multilayer lubricant film has been studied to reduce the rapid oxidation tendency of sputtered MoS₂ film. The AES depth profile of MoS₂ film shows evenly distributed oxygen throughout the layer. However, by sputtering the PTFE as a top layer, the penetration of oxygen has been drastically suppressed. When the thickness of PTFE is about 500Å the friction coefficient of multilayer reduces from 0.34 to 0.15 in air. The optimum working pressure of argon and temperature of substrate are about 10m torr and 150℃, respectively, which show the largest grain size of MoS₂.