발간논문

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Vol.32, No.8, 946 ~ 952, 1994
Title
High Temperature Behavior of TiC Films Deposited by PECVD (1) ( Variation in Chemical Composition and State )
남옥현Ok Hyun Nam, 이인우In Woo Lee, 김문일Moon Il Kim
Abstract
This paper is intended as an investigation of high temperature behavior of TiC films deposited on the SKH9 tool steels by PECVD. Vacuum annealing of SKH9/TiC samples was performed in the temperature range of 700∼1000℃, and the variation in chemical composition and state was studied by AES, RGA and XPS analysis, and also micro hardness and scratch test was conducted. By vacuum annealing, Ti/C ratio of TiC films became about 1, and chlorine and oxygen contents in the films decreased. The chemical state of chlorine in the TiC lattice was Ti-Cl or Ti-C-H-Cl banding and evaporated to form Cl₂ or HCl with vacuum annealing. Oxygen formed TiO₂, TiO_xCl, H₂O and Ti-C-H-O compound. With the increase of the annealing temperature, the amount of TiO₂ bonding increased, but total oxygen content in the films decreased because of evaporation of H₂O or decomposition of TiO_xCl and Ti-C-H-O bond. Judging from the above results, it is obvious that hydrogen exists in the TiC films. Also, The micro hardness and critical load of TiC films decreased with the vacuum annealing.
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