발간논문

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Vol.32, No.5, 567 ~ 573, 1994
Title
Computer Simulation of Ion Plating Process by Monte Carlo Method
주정훈 Jung Hoon Joo
Abstract
Basic research has shown that ion plating has its advantage in producing highly adhesive film which can be controlled by gas pressure and discharge conditions like current-voltage characteristics, electrode geometry, assisting magnetic field. In this study, an ion energy analyzer is computer-aided designed to fit to a quadrupole mass spectrometer so as to give energy and mass spectra of ions. Energy distributions for ions and neutrals were simulated using Monte Carlo method in axi-symmetric 3D electrostatic field model. Charge exchange collisions and elastic collisions are incorporated. In the range of gas pressures between 0.8mTorr and 10mTorr, the average energy of positive ions is equivalent to 25% of substrate bias and that of charge-exchanged fast neutrals is equivalent to 13% of it. In comparison of measured energy distribution of Ti^+ and simulated result shows agreement well over the entire range except high energy tail.
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