Crystallization - Induced Plasticity of Al - based Amorphous Alloys
김영환Y . H . Kim, 김성규S . G . Kim, 조형호H . H . Cho
Abstract
Microstructure and magnetic properties of CoCrPt/Cr thin films were investigated as a function of sputtering condition during the deposition of CoCrPt thin films. Strong separation of Co grains was observed with increasing argon sputtering pressure due to the enhanced scattering of argon ions with sputtering particles, thereby resulting in the reduced exchange coupling and also the increased coercivity by a factor of four. Plane and cross sectional TEM indicated that most Co grains sputtered at high pressure were separated by 10-20Å thick boundary and share their growth on bigger Cr grains. The Co grain separation decreased with the application of substrate bias and disappeared by -200V bias. The bias sputtered CoCrPt thin films decreased their grain size and increased epitaxial growth on Cr layer and also (101 ̄0) texture. The slight decrease in squareness of bias sputtered films resulted from the residual stress in the films. The required magnetic field to saturate the film significantly increased with increasing substrate bias.