발간논문

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Vol.31, No.7, 831 ~ 839, 1993
Title
Measurements of Ion ' s Kinetic Energy Distributions in Plasmas for Ion Plating
주정훈Jung Hoon Joo, 한봉희Bong Hee Hahn
Abstract
Kinetic energy analysis of mass filtered ions emitting from ion plating plasmas was carried out in search of optimum discharge condition that gives maximal reactivity of TiN formation and enhanced adhesion due to the fast depositing particles. The ion energy distribution was analyzed by the cylindrical energy analyzer. In a gas discharge of Ar at a pressure of 50mTorr and high anode voltage, Ar^+ and Ar^(++) show two main peaks at the energy equivalent to 90∼120% of anode voltage, which seem to have different ionization region. In a mixed gas discharge of Ar and N₂, the addition of Ar into N₂discharge enhances N₂^+`s mean kinetic energy, but the addition of N₂into Ar discharge certainly decreases the main peak energy of Ar^+ and broadens the energy distribution. This phenomenon was interpreted using charge exchange collision in a cathode sheath and local potential distribution in glow region.
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