발간논문

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Vol.30, No.1, 75 ~ 82, 1992
Title
Reaction Kinetics in Deposition of Nitrides by magnetron Sputtering
김종희Jong Hee Kim, H . A . JehnHermann A . Jehn
Abstract
ZrN_x, NbN_x, and MoN_x coatings were deposited onto high speed steel substrates by reactive dc magnetron sputtering in an argon-nitrogen atmosphere. The target and substrate surface reactions were described in order to explain experimental results on the deposition rate and coating composition as a function of the nitrogen partial pressure. As a result of the reactions the target contamination, the sputter yield of the contaminated target surface, and the formal reaction coefficients of gaseous nitrogen with the deposited metal atoms were obtained. Special emphasis was laid on the effect of the position of the metals in the periodic system of elements. The reactivity was strongly governed by the thermochemistry of the respective metal-nitrogen systems.
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