발간논문

Home > KJMM 논문 > 발간논문

Vol.29, No.11, 1211 ~ 1218, 1991
Title
Preparation of Titanium Boride Films by Chemical Vapor Deposition (2) ( Titanium Boride films on WC Substrate )
김수식Soo Sik Kim, 정병근Byung Kn Jeong, 민정식Jeong Sik Min
Abstract
TiB₂ coatings on WC substrates were investigated using BCl₃-TiCl₄-H₂ system by CVD process at various pressure conditions. The measured microhardness values of coated layer were 3800 KHN under 40 torr of pressure and 3280 KHN 760 torr of pressure at, the reaction temperature of 1200℃ The coated layer displayed a-axis preferred orientation, and the average lattice parameters were 3.034Å for a-axis and 3.231Å for c-axis. Diffusion controlled process, had a small activation energy of 3㎉/㏖, dominated at higher temperature than 910℃, while chemically controlled process, had a high activation energy of 24㎉/㏖, governed at lower temperature than 910℃.
Key Words
| PDF
대한금속∙재료학회 │ (06633) 서울시 서초구 서초대로 56길 38 대한금속∙재료학회 회관 (서초1동 1666-12번지)
Tel : 070-4266-1646 │ FAX : 02-557-1080 │ E-mail : metal@kim.or.kr
Copyright ⓒ 2013 사단법인 대한금속∙재료학회 All rights reserved.