발간논문

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Vol.29, No.6, 570 ~ 576, 1991
Title
The Plasma diagnosis and Its Applications of TiN Ion Plating (1) ( Plasma Mass Spectrometry and Discharge optimization )
주정훈Jung Hoon Joo, 한봉희Bong Hee Hahn
Abstract
Low pressure gas plasma for TiN ion plating was analyzed by differentially pumped Plasma Mass Spectrometer. Identification of chemical species and the relative intensities of reactant gases were traced as varying discharge conditions;anode voltage, electron energy, electron density in order to obtain optimum discharge conditions. There exists optimal ionizing electron current which gives maximum substrate current. Ion current ratio of Ar^(+2) and Ar^+ showed a maximum at anode voltage 80V, electron energy 75eV, but N₂^+/N^+ increases with anode voltage, which gives maximum substrate current. Under those conditions, the product mass spectrum TiN^+ was obtained successfully first in the reference
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