A Study on the magnetic properties of CoNbZr Thin Films Deposited by a R . F . Magnetron Sputtering
강남석Nam Seok Kang, 이택동Tae Dong Lee, 이경섭Kyung Sub Lee
Abstract
Effects of sputtering conditions and rotating field annealing(RFA) on magnetic properties of CoNbZr thin films were studied. With increasing Ar pressure from 0.5 to 10 coercivity showed constant value until 5mTorr, then increased at the higher pressure. Co_(90.1)Nb_(6.7)Zr_(3.2)filM of 0.3㎛ thick showed 4 πMs of 11.5 kGauss, curies temperature of 540℃ and crystallizetion temperature of 520℃, and thess values did not change with sputtering parameters and RFA. Magnetic properties of as-asputtered films with and without applied external during sputtering showed significant differences. However, those differences were greatly reduced as the following RFA temperatures increased. The origin of coercivity was considered to be affributed to magnetostricition in this film.