| ZrN was deposited on a 304 stainless steel substrate by the reactive sputtering technique, and deposition rate and nitrogen content of deposits were measured as functions of partial pressures of N₂and Ar gases, the input power and the substrate bias voltage, respectively. X-ray diffractometer and scanning electron microscope were used to analyse the preferred orientation and morphology of the deposits. Deposition rate decreased rapidly with increasing the N₂pressure and decreasing the input power, while it decreased slowly with increasing the Ar pressure and decreasing the bias voltage. The N/Zr ratio of the deposts was in the range of 1.6-1.77 for the most deposition conditions. ZrN coatings deposited without any bias voltage showed columnar structure with a strong(111) preferred orientation, and the crystallites were fine and the surface was smooth. Those deposited with bias voltage showed a mixed texture of(111)-(311), where the columnar structure was more or less suppressed. |
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