발간논문

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Vol.24, No.12, 1316 ~ 1323, 1986
Title
Influence of Sputtering Condition on the Thin Film Characteristics in Co - base Alloys
김희중H . J . Kim, 한석희S . H . Han, 이택동T . D . Lee, 강일구I . K . Kang
Abstract
Characteristics of several Co-base alloy thin films were studied in relationship with sputtering parameters. Thicknessuniformity of the films on 10 inch substrate were investigated by changing the distance between substrate and target. It was found that deposition rate increased with increasing input power, and decreased with increasing the substrate temperature and the distance between substrate and target. Substrate temperature increased with increasing input power and time. The solute concentration of film linearly increased with increasing the area ratio of solute metal on a Co target. The relative solute concentration of film to area ratio of target decreased in the order of Mo, Nb, Zr and V. The relative differences were discussed in terms of sputter yield.
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