발간논문

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Vol.24, No.6, 712 ~ 729, 1986
Title
Plasma Deposition of Diamond - like carbon and Boron Nitride
K . Akashi , T . Yoshida , S . Komatsu, Y . Mitsuda
Abstract
Many research works for deposition of polycrystalline diamond-like carbon film are being carried out in Japan. In this report, a micro wave plasma CVD process of the diamond-like carbon film on a silicon substrate by a mixture of methane and hydrogen was described simply. The diagnostics of chemical species in the plasma was put to the test by using emission spectroscopy. The film was identified by various analytical techniques such as IR spectroscopy and Auger Electron Spectroscopy. The mechanism of such film deposition was discussed and the significance of the presence of atomic hydrogen and hydrocarbon radicals in the plasma was emphasized, There have been very few reports about the deposition of cubic or wurtzite-type boron nitride. The deposition of boron nitride film was confirmed by chemical vapor transport from solid boron particles under an Rf hydrogen-nitrogen plasma stream. The film consisted of a mixture of hexagonal and wurtzite-type boron nitride crystals was deposited on a silicon substrate. Various chemical species in the plasma were identified by a quadrupole mass spectroscopy and the mechanism of the film deposition was discussed.
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