발간논문

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Vol.6, No.3, 160 ~ 167, 1968
Title
The Initial Oxidation Rate Study of Electropolished Cadimum Surfaces
조종수 Jong S . Cho
Abstract
The initial oxidation rate on electropolished cadmium surfaces was studied at the temperature range of 100 to 195℃ and the initial oxygen pressure range of (7∼8)×10^(-1)㎜ Hg by using manometric method in a constant volume of reaction cell. The reproducibility of oxidation rate is greatly affected by the surface preparation. Some of these effects were shown. Two stages of logarithmic initial oxidati on rate were observed in the temperature range of 100 to 180℃. No longer the log-arithmic rate above about 195℃ was observed. The density of sites for trapped electrons in the constant density space-charge layer and the density of available sites for trapped charge in the diffuse layer were calculated by using Uhlig`s concept for space-charge effects, showing 1.53×10^(18) and 1.17×10^(18) per cubic centimeter at 180℃, respectively. The empirical and calculated values of oxide thicknesses at which the second stage oxidation begins for electropolished surfaces was revealed much thinner than those of mechanically polished surfaces in other metals, and these values were 6.3 and 11.86Å at 180℃ respectively. Some of initial oxidation characteristics on an evaporated clean cadmium film were shown in comparing with that of the electropolished surface.
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